Keywords: ماشینکاری مکانیکی شیمیایی; Hydroxyl radical; Fenton reaction; Silicon carbide; Chemical mechanical polishing;
مقالات ISI ماشینکاری مکانیکی شیمیایی (ترجمه نشده)
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Keywords: ماشینکاری مکانیکی شیمیایی; Chemical mechanical polishing; Silicon wafer; Surface morphology; Chemical reaction of slurry;
Keywords: ماشینکاری مکانیکی شیمیایی; Fine grinding; Lapping; Polishing; Surface quality; Sapphire; Tool and process design; Diamond tools; Crystal machining; Diamond mechanical polishing; Chemical mechanical polishing; Diamond polish;
Keywords: ماشینکاری مکانیکی شیمیایی; Silicon carbide; Chemical mechanical polishing; Thermal oxidation; Atomic step; Scratch-free;
Keywords: ماشینکاری مکانیکی شیمیایی; Ceria; Mesoporous silica; Core/shell structure; Abrasive particle; Chemical mechanical polishing;
Keywords: ماشینکاری مکانیکی شیمیایی; Chemical mechanical polishing; Hydrodynamic lubrication; Carrier structure; Fluid pressure;
Keywords: ماشینکاری مکانیکی شیمیایی; Sapphire; Chemical mechanical polishing; Silica; Atomic step structure; AFM;
Keywords: ماشینکاری مکانیکی شیمیایی; Chemical mechanical polishing; Reynolds equation; Coriolis force; Ekman boundary layer;
Keywords: ماشینکاری مکانیکی شیمیایی; ANSYS-FLUENT; Fibrous filters; Fiber efficiency; Chemical mechanical polishing; Colloidal ceria dispersion;
Keywords: ماشینکاری مکانیکی شیمیایی; Chemical mechanical polishing; Megasonic vibration; Silicon wafer; Matching layer; Surface quality;
Keywords: ماشینکاری مکانیکی شیمیایی; Chemical mechanical polishing; Wear modelling; Corrosion-wear; Mapping;
Keywords: ماشینکاری مکانیکی شیمیایی; Hybrid bonding; Single-micron pitch; Non-conductive film; Chemical mechanical polishing; Underfill; 3D integration;
Keywords: ماشینکاری مکانیکی شیمیایی; Chemical mechanical polishing; Ceria-based polishing powders; Polishing efficiency; Crystallinity; Cerium (III) content
Keywords: ماشینکاری مکانیکی شیمیایی; Crystal orientation; Chemical mechanical polishing; Quasi-continuum method; Single crystal copper;
Keywords: ماشینکاری مکانیکی شیمیایی; Implantable biomaterials; Surface structuring; Chemical mechanical polishing; Biocompatibility;
Keywords: ماشینکاری مکانیکی شیمیایی; Abrasive; Copper; Chemical mechanical polishing; Post-cleaning; Tetramethylammonium hydroxide (TMAH); Citric acid; Perfluorobutanesulfonic acid (PFBS);
Keywords: ماشینکاری مکانیکی شیمیایی; Chemical mechanical polishing; Boron doped polysilicon; Dry friction
Keywords: ماشینکاری مکانیکی شیمیایی; Chemical mechanical polishing; Transparent conductive oxide; Cationic polymer; Spherical microbeads; Surface morphology; Organic light emitting diodes;
Keywords: ماشینکاری مکانیکی شیمیایی; Chemical mechanical polishing; Copper; Periodate; Surface chemistry; Material removal mechanism;
Keywords: ماشینکاری مکانیکی شیمیایی; Chemical mechanical polishing; Ruthenium; Periodate; Passivation film; Surface chemistry;
Keywords: ماشینکاری مکانیکی شیمیایی; Operational optimization; Clustered Multi-Task Learning; Chemical Mechanical Polishing; Small sample size; Modelling
Keywords: ماشینکاری مکانیکی شیمیایی; Chemical mechanical polishing; AISI 52100 steel; Glycine; Hydrogen peroxide; Benzotriazole;
Keywords: ماشینکاری مکانیکی شیمیایی; Tungsten corrosion; Chemical mechanical polishing; Nickel silicide; Contact plugs; Electrochemical effect
Keywords: ماشینکاری مکانیکی شیمیایی; Material removal mechanism; Crystalline silicon substrate; Oxide film; Impact; Molecular dynamics simulation; Chemical mechanical polishing;
Keywords: ماشینکاری مکانیکی شیمیایی; Material removal mechanism; Porous silica cluster; Impact; Molecular dynamics simulation; Chemical mechanical polishing;
Keywords: ماشینکاری مکانیکی شیمیایی; Surface-modified diamond; Micro-fabrication; Electroforming; Chemical mechanical polishing; Diamond dresser;
Evaluation of subsurface damage inherent to polished GaN substrates using depth-resolved cathodoluminescence spectroscopy
Keywords: ماشینکاری مکانیکی شیمیایی; Subsurface damage; Chemical mechanical polishing; Non-radiative recombination; Cathodoluminescence spectroscopy; Gallium nitride;
Inhibition effect of glycine on molybdenum corrosion during CMP in alkaline H2O2 based abrasive free slurry
Keywords: ماشینکاری مکانیکی شیمیایی; Chemical mechanical polishing; Corrosion inhibitor; Glycine; Alkaline slurry;
Core/shell structured sSiO2/mSiO2 composite particles: The effect of the core size on oxide chemical mechanical polishing
Keywords: ماشینکاری مکانیکی شیمیایی; Solid silica core; Mesoporous silica shell; Composite particle; Abrasive; Chemical mechanical polishing;
Redox agent enhanced chemical mechanical polishing of thin film diamond
Keywords: ماشینکاری مکانیکی شیمیایی; Chemical mechanical polishing; Diamond;
Investigation on the variation of the step-terrace structure on the surface of polished GaN wafer
Keywords: ماشینکاری مکانیکی شیمیایی; Chemical mechanical polishing; Gallium nitride; Step-terrace structure;
Atomistic mechanisms of Si chemical mechanical polishing in aqueous H2O2: ReaxFF reactive molecular dynamics simulations
Keywords: ماشینکاری مکانیکی شیمیایی; Silicon; Chemical mechanical polishing; H2O2; ReaxFF; Molecular dynamics simulation;
Coagulative colloidal gas aphrons generated from polyaluminum chloride (PACl)/dodecyl dimethyl betaine (BS-12) solution: Interfacial characteristics and flotation potential
Keywords: ماشینکاری مکانیکی شیمیایی; CGA; colloidal gas aphrons; PACl; polyaluminium chloride; BS-12; dodecyl dimethyl betaine; CMP; chemical mechanical polishing; CMC; critical micellar concentration; (BS-12)-CGA; colloidal gas aphrons generated from pure BS-12 solution; IEP; isoelectric po
Germanium electrochemical study and its CMP application
Keywords: ماشینکاری مکانیکی شیمیایی; Ge; Chemical mechanical polishing; Electrochemical property; Surface morphology; Selectivity; Removal rate;
Core-shell structured polystyrene coated silica composite abrasives with homogeneous shells: The effects of polishing pressure and particle size on oxide-CMP
Keywords: ماشینکاری مکانیکی شیمیایی; Polystyrene core; Homogeneous silica shell; Abrasives; Polishing pressure; Chemical mechanical polishing;
Effect of photocatalytic oxidation technology on GaN CMP
Keywords: ماشینکاری مکانیکی شیمیایی; GaN; Chemical mechanical polishing; Photocatalytic oxidation; Mechanism; H2O2-SiO2-based slurry;
Atomic insight into tribochemical wear mechanism of silicon at the Si/SiO2 interface in aqueous environment: Molecular dynamics simulations using ReaxFF reactive force field
Keywords: ماشینکاری مکانیکی شیمیایی; Tribochemical wear; Si/SiO2 interface; Aqueous environment; MEMS; Chemical mechanical polishing; ReaxFF molecular dynamics simulation;
Silica abrasives containing solid cores and mesoporous shells: Synthesis, characterization and polishing behavior for SiO2 film
Keywords: ماشینکاری مکانیکی شیمیایی; Silica; Mesoporous; Core-shell structure; Abrasive; Chemical mechanical polishing;
Improvement of material removal rate of single-crystal diamond by polishing using H2O2 solution
Keywords: ماشینکاری مکانیکی شیمیایی; Polishing; Diamond; Surface smoothing; OH radical; Chemical mechanical polishing; Tribochemical;
Effects of catalyst concentration and ultraviolet intensity on chemical mechanical polishing of GaN
Keywords: ماشینکاری مکانیکی شیمیایی; GaN; Chemical mechanical polishing; Catalyst concentration; Photocatalytic oxidation; Ultraviolet intensity;
Ultra-smooth BaTiO3 surface morphology using chemical mechanical polishing technique for high-k metal-insulator-metal capacitors
Keywords: ماشینکاری مکانیکی شیمیایی; Barium titanate; Surface roughness; Chemical mechanical polishing; Slurry type; Head rotational speed; Down pressure;
The pH-dependant attachment of ceria nanoparticles to silica using surface analytical techniques
Keywords: ماشینکاری مکانیکی شیمیایی; Adhesion; Si; Ce; X-ray photoelectron spectroscopy; Chemical mechanical polishing;
Investigation on S-136 steel surface planarization by chemical mechanical polishing
Keywords: ماشینکاری مکانیکی شیمیایی; S-136 steel; Chemical mechanical polishing; Atomic force microscopy; Material removal rate; Removal mechanism
Investigation on the surface characterization of Ga-faced GaN after chemical-mechanical polishing
Keywords: ماشینکاری مکانیکی شیمیایی; Chemical mechanical polishing; Gallium nitride; SiO2 abrasive; Catalyst; Atomic step structure;
Polymethylmethacrylate (PMMA)/CeO2 hybrid particles for enhanced chemical mechanical polishing performance
Keywords: ماشینکاری مکانیکی شیمیایی; Hybrid particle; Ceria; Fixed abrasive pad; Chemical mechanical polishing;
Formation of Ge(111) on Insulator by Ge epitaxy on Si(111) and layer transfer
Keywords: ماشینکاری مکانیکی شیمیایی; Ge-on-Insulator; Ge(111); Tensile strain; Chemical mechanical polishing;
High resolution nanotopography characterization at die scale of 28 nm FDSOI CMOS front-end CMP processes
Keywords: ماشینکاری مکانیکی شیمیایی; Chemical mechanical polishing; Characterization; Die-level; Metrology; T-box; Within die non-uniformity
Chemical mechanical planarization of patterned InP in shallow trench isolation (STI) template structures using hydrogen peroxide–based silica slurries containing oxalic acid or citric acid
Keywords: ماشینکاری مکانیکی شیمیایی; Chemical mechanical polishing; Planarization; Dishing; Oxide loss; Selectivity; Oxalic acid; Citric acid; Scanning electron microscope; Shallow trench isolation
Evaluation of subsurface damage in GaN substrate induced by mechanical polishing with diamond abrasives
Keywords: ماشینکاری مکانیکی شیمیایی; GaN substrate; Mechanical polishing; Chemical mechanical polishing; Subsurface damage; Cathodoluminescence; Brittle materials;
Compressive elastic moduli and polishing performance of non-rigid core/shell structured PS/SiO2 composite abrasives evaluated by AFM
Keywords: ماشینکاری مکانیکی شیمیایی; Core/shell composite microspheres; Compressive Young's modulus; Chemical mechanical polishing;