Effect of photocatalytic oxidation technology on GaN CMP

- Photocatalytic oxidation technology was introduced to GaN CMP for the first time and proves to be more efficient than before.
- XPS analysis reveals the planarization process by different N-type semiconductor particles.
- Analyzing the effect of pH on photocatalytic oxidation in GaN CMP.
- Proposing the photocatalytic oxidation model to reveal the removal mechanism.