کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
545515 1450554 2009 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Multiscale simulation of aluminum thin films for the design of highly-reliable MEMS devices
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Multiscale simulation of aluminum thin films for the design of highly-reliable MEMS devices
چکیده انگلیسی

A multiscale simulation methodology is presented to predict the macroscopic mechanical properties of aluminum thin films with a columnar grain structure from the morphology at microscopic scale. The elasto–plastic characteristics of the thin films are calculated as a function of the grain size, temperature, and strain rate by taking into account creep phenomena. The simulated data are validated by experimental stress–strain curves measured by dedicated microstructures in conjunction with a nanoindentation test equipment.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronics Reliability - Volume 49, Issues 9–11, September–November 2009, Pages 1278–1282
نویسندگان
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