کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
545534 1450554 2009 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Analysis of deep submicron VLSI technological risks: A new qualification process for professional electronics
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Analysis of deep submicron VLSI technological risks: A new qualification process for professional electronics
چکیده انگلیسی

A large range of commercial deep submicron VLSI devices are used for avionic designs. Due to the scaling down, an ever higher level of integration and the use of new materials in foundries, the main failure mechanisms are changing while new ones appear. Lifetimes related to these failure mechanisms are suspected of being shorter and shorter so failure rate prediction becomes a great challenge for deep submicron (DSM) semiconductor reliability. We propose in this paper, a new approach based on technologies analysis in order to determine potential reliability risks regarding the specific use of DSM components for avionic applications.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronics Reliability - Volume 49, Issues 9–11, September–November 2009, Pages 1381–1385
نویسندگان
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