کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5461795 | 1398797 | 2017 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
The effects of the argon plasma treatments on transparent conductive aluminum-dope zinc oxide thin films prepared by the pulsed DC magnetron sputtering
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فلزات و آلیاژها
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چکیده انگلیسی
Transparent conductive aluminum-doped zinc oxide (ZnO:Al or AZO) thin films were fabricated by the pulsed DC magnetron sputtering deposition. The prepared AZO thin films were carefully treated with the argon plasma treatments in the vacuum state with a variety of the plasma conditions, i.e., the control power and the operated pressure. The plasma-treated AZO samples were then investigated for their crystal structures by X-ray diffraction (XRD). Their physical morphologies and surface topologies were examined by field emission scanning electron microscopy (FE-SEM) and atomic force microscopy (AFM). Electrical properties of the samples were measured with the four-point probe and the Hall effect measurements. Finally, their optical transmission was observed with the UV-Vis-NIR spectrophotometry. The results from the as-deposited and the plasma-treated AZO thin films will be compared and discussed.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Today: Proceedings - Volume 4, Issue 5, Part 2, 2017, Pages 6248-6253
Journal: Materials Today: Proceedings - Volume 4, Issue 5, Part 2, 2017, Pages 6248-6253
نویسندگان
P. Muthitamongkol, C. Thanachayanont, B. Samransuksamer, K. Seawsakul, M. Horprathum, P. Eiamchai, S. Limwichean, V. Patthanasettakul, N. Nuntawong, P. Songsiriritthiguland, P. Chindaudom,