Gas flow sputtering for manufacture of high quality hard magnetic films

In this paper results of gas flow sputtering (GFS), a modification of hollow cathode processes, for deposition of hard magnetic CoSm films are presented. Especially for the deposition of thick films (10 μm and more) gas flow sputtering is an economic process. Using GFS high dynamic deposition rates of several 10 μm per hour are achievable. The influence of the deposition parameters on the magnetic properties coercivity and magnetic remanence are discussed.