Ceramic coating deposition by electron beam evaporation

We describe a new method for the deposition of protective ceramic-based coatings. The novelty of the method lies in the unique interaction of the electron beam with a dielectric target, in which ions in the beam-produced plasma neutralize the target surface charge build-up. This effect is brought about by the use of our novel forevacuum-pressure, plasma-cathode electron beam source, which can produce energetic, focused electron beams, with associated beam-produced plasmas, in the previously inaccessible pressure range of 1-100 Pa. The work described here demonstrates the evaporation of aluminum oxide ceramic by electron beam bombardment and the subsequent deposition of an alumina coating. A significant increase in the microhardness of the ceramic-coated Ti substrate and a uniform depth-distribution of the elemental composition has been determined. The approach described here opens up new opportunities for the deposition of coatings in various fields of industry.