Products pre-treatment and beam-assisted deposition of magnetron sputtered coatings using a closed cylindrical grid inside a planetary rotation system

For pre-treatment of dielectric and conductive products planetary rotating inside a process vacuum chamber and beam-assisted deposition on the products of magnetron sputtered coatings, a closed cylindrical grid is placed inside the planetary rotation system. When magnetron targets are disconnected from power supplies, the chamber is filled with plasma of glow discharge at argon pressure of 0.2-1 Pa. Application to the grid of negative voltage up to 3 kV results in production of fast neutral argon atoms with energy up to 3 keV, which bombard the rotating products heating and etching them. When magnetrons are switched on, and high-voltage pulses are applied to the grid, mixing by high-energy gas atoms of the product and coating atoms results in appreciable improvement of adhesion and other properties of the coatings.