کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5467202 | 1518618 | 2017 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Design considerations for a compact proton beam writing system aiming for fast sub-10Â nm direct write lithography
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Design considerations for a compact proton beam writing system aiming for fast sub-10Â nm direct write lithography Design considerations for a compact proton beam writing system aiming for fast sub-10Â nm direct write lithography](/preview/png/5467202.png)
چکیده انگلیسی
In order to realize sub-10Â nm feature size by proton beam writing (PBW) with writing speed comparable to electron beam lithography (EBL), a 200Â kV compact PBW system is proposed here. In this system, a new nano-aperture electron impact ion source with a potential reduced brightness of 106Â A/(m2Â srV) will be employed. To achieve sub-10Â nm spot sizes with pA beam current, two different focusing lens configurations were evaluated. Both of these configurations were found to be theoretically capable of achieving sub-10Â nm beam spot size.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 404, 1 August 2017, Pages 243-249
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 404, 1 August 2017, Pages 243-249
نویسندگان
Xinxin Xu, Nannan Liu, P. Santhana Raman, Sarfraz Qureshi, Rudy Pang, Anjam Khursheed, Jeroen A. van Kan,