کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5467294 1518611 2017 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Modelling the deposition process on the CdTe/CdS interface
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سطوح، پوشش‌ها و فیلم‌ها
پیش نمایش صفحه اول مقاله
Modelling the deposition process on the CdTe/CdS interface
چکیده انگلیسی
We deposit a CdxTey (x,y=0,1) cluster onto the wurtzite (1 1 1) Cd and S terminated CdS surfaces with energies ranging from 1 to 40 eV. More than 1200 simulations have been performed for each of these cases so as to sample the possible deposition positions and to collect sufficient statistics. The results show that Cd atoms are more readily sputtered from the surface than Te atoms and the sticking probability is higher on S terminated surfaces than Cd terminated surfaces. They also show that increasing the deposition energy typically leads to an increase in the number of deposited atoms replacing surface atoms and tends to decrease the number of atoms that sit on the surface layer, whilst increasing the number of interstitials observed.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 412, 1 December 2017, Pages 66-70
نویسندگان
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