Miniature SAW device using MEMS technology

A miniature SAW device is designed and fabricated at 1 GHz for wireless communication system. A 5 μm thin film of ZnO is successfully deposited using RF sputtering technique on plasma-enhanced chemical deposition (PECVD) SiO2 layer of 1 μm on top of Si wafer under various operating conditions. The c-axis-oriented ZnO film exhibit a sharp diffraction peak corresponding to the (0 0 2) reflection at 2θ=34.42. The fabrication process utilizing the micro-electro-mechanical systems (MEMS) technology of the SAW device is described. Simulation of the RF-SAW filter is performed. Measurements and experimental work are presented for the RF-SAW device.