کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
548047 | 872089 | 2006 | 5 صفحه PDF | دانلود رایگان |
![عکس صفحه اول مقاله: Growth, structure, and morphology of TiO2 films deposited by molecular beam epitaxy in pure ozone ambients Growth, structure, and morphology of TiO2 films deposited by molecular beam epitaxy in pure ozone ambients](/preview/png/548047.png)
TiO2 films were grown using a reactive molecular beam epitaxy system equipped with high-temperature effusion cells as sources for Ti and an ozone distillation system as a source for O. The growth mode, characterized in-situ by reflection high-energy electron diffraction (RHEED), as well as the phase assemblage, structural quality, and surface morphology, characterized ex-situ by X-ray diffraction and atomic force microscopy (AFM), depended on the choice of substrate, growth temperature, and ozone flux. Films deposited on (1 0 0) surfaces of SrTiO3, (La0.27Sr0.73)(Al0.65Ta0.35)O3, and LaAlO3 grew as (0 0 1)-oriented anatase. Both RHEED and AFM indicated that smoother surfaces were observed for those grown at higher ozone fluxes. Moreover, while RHEED patterns indicated that anatase films grown at higher temperatures were smoother, AFM images showed presence of large inclusions in these films.
Journal: Microelectronics Journal - Volume 37, Issue 12, December 2006, Pages 1493–1497