Interfacial evolution and bond reliability in thermosonic Pd coated Cu wire bonding on aluminum metallization: Effect of palladium distribution

• Effect of Pd distribution on the growth rate of Cu–Al IMCs was investigated.
• Effect of Pd distribution on the bond interface microstructure was also studied.
• Nano-voids observed at bond interface of Pd rich sample in the as-bonded state
• Presence of Pd at bond interface slows down IMC growth during thermal annealing.
• Large cavities on sample bond edge with no Pd in as-bonded state after annealing

In this paper, the growth kinetics of Cu–Al intermetallic compounds formed during isothermal annealing of Pd–Cu wire bonds with different palladium distribution at 175 °C are investigated by electron microscopy and compared to bare Cu wire bonds. Transmission electron microscopy (TEM) was used to provide high resolution imaging of the Cu–Al IMCs in the as-bonded state and TEM-EDX used to analyze the concentrations of Pd at the bond interface in the as-bonded state. Cu–Al IMCs were found to grow thicker with increasing annealing duration. The growth kinetics of the Cu–Al IMCs were correlated with the diffusion process during thermal annealing. The IMC thickness for Pd–Cu wire bonds with Pd at the bond interface was found to be thinner as compared to that for Pd–Cu wire bonds with no Pd at the bond interface. Thus, the presence of palladium at the bond interface has slowed down the IMC growth. Nano-voids were found in the Pd–Cu wire bonds with Pd at the bond interface, but not in the Pd–Cu wire bonds with no Pd at the bond interface. The IMC growth rate for the Pd–Cu bonds with no Pd was found to be close to that for bare Cu for the initial annealing durations. Corresponding bond pull testing showed that Pd–Cu wire bonds containing Pd have best preserved the bond strength after 168 h aging at 175 °C due to the beneficial presence of Pd.