Effect of thermal annealing sequence on the crystal phase of HfO2 and charge trap property of Al2O3/HfO2/SiO2 stacks

Effect of thermal annealing sequence on the crystal phase of HfO2 and charge trap property of Al2O3/HfO2/SiO2 stacks

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Current Applied Physics - Volume 17, Issue 10, October 2017, Pages 1361-1366

Heedo Na, Juyoung Jeong, Jimin Lee, Hyunsu Shin, Sunghoon Lee, Hyunchul Sohn,