کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5492946 | 1526260 | 2017 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Evaluation of high grid strip densities based on the moiré artifact analysis for quality assurance: Simulation and experiment
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
فیزیک و نجوم
ابزار دقیق
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
We have recently developed precise x-ray grids having strip densities in the range of 100 - 250 lines/inch by adopting the precision sawing process and carbon interspace material for the demands of specific x-ray imaging techniques. However, quality assurance in the grid manufacturing has not yet satisfactorily conducted because grid strips of a high strip density are often invisible through an x-ray nondestructive testing with a flat-panel detector of an ordinary pixel resolution (>100 μm). In this work, we propose a useful method to evaluate actual grid strip densities over the Nyquist sampling rate based on the moiré artifact analysis. We performed a systematic simulation and experiment with several sample grids and a detector having a 143-μm pixel resolution to verify the proposed quality assurance method. According to our results, the relative differences between the nominal and the evaluated grid strip densities were within 0.2% and 1.8% in the simulation and experiment, respectively, which demonstrates that the proposed method is viable with an ordinary detector having a moderate pixel resolution for quality assurance in grid manufacturing.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment - Volume 866, 11 September 2017, Pages 58-64
Journal: Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment - Volume 866, 11 September 2017, Pages 58-64
نویسندگان
U.K. Je, C.K. Park, H.W. Lim, H.S. Cho, D.Y. Lee, H.W. Lee, K.S. Kim, S.Y. Park, G.A. Kim, S.Y. Kang, J.E. Park, W.S. Kim, D.H. Jeon, T.H. Woo,