Magnetic anisotropy of Fe films deposited by dc magnetron sputtering under an external magnetic field

Magnetic Fe films grown on single-crystal MgO (001) and (011) substrates were prepared by direct current magnetron sputtering. The experimental results showed that by applying an external magnetic field of about 300 Oe to film during deposition, a fourfold cubic magnetic anisotropy on MgO (001) substrate and a twofold uniaxial magnetic anisotropy on MgO (011) substrate were generated, compared to the isotropic magnetization of Fe film grown without applying the external magnetic field. Our results suggested that external magnetic field during preparation effectively induced relatively higher surface mobility of sputtered Fe atoms and further promoted the crystallization of Fe film and the enhancement of magnetic anisotropy.