کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
629048 | 1455498 | 2006 | 7 صفحه PDF | دانلود رایگان |
Fluoropolymer films were deposited by plasma polymerization of 1.1.1-trifluoroethane (CF3-CH3). CF3-CH3 plasma polymerization characteristics and deposition rate of the polymer film were studied using a common industrial parallelplate plasma reactor. The chemical structure of the CF3-CH3 plasma polymer film was analyzed by FTIR and XPS techniques. The study shows that CF3-CH3 plasma polymerization is divided into two regions: energy deficient and monomer deficient. The deposition rate of the polymer film (Rd) increased with an increase of W/Fm, reached a maximum value, and then decreased. Analysis of the chemical structure indicates that the CF3-CH3 plasma polymer is CF3, CF2, CF, C-CFn, C-C groups, possessing a cross-linking network structure.
Journal: Desalination - Volume 192, Issues 1–3, 10 May 2006, Pages 234-240