کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
6745578 | 504973 | 2015 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Influence of grain boundaries and pre-precipitates on ion implantation-induced precipitation in the V-4Cr-4Ti alloy
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی انرژی
مهندسی انرژی و فناوری های برق
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چکیده انگلیسی
The V-4Cr-4Ti alloy which contains the pre-precipitates has been subjected to implantation of high energy ions at room temperature. It was found that the Ti-rich precipitates occur at grain boundaries while the far finer precipitates form within the grains. The ion implantation also results in variation of appearance of the pre-precipitates in the samples. These results indicate that diffusion in the samples is obviously enhanced by ion implantation-induced vacancies. The vacancies will disappear at the grain boundaries and the precipitates/matrix interfaces, which will transfer vanadium atoms prior out of the boundaries or the interfaces due to Kirkendall effect. In this way, the Ti-rich precipitates will form at the boundaries. Meanwhile, the pre-precipitates will change their shape.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Fusion Engineering and Design - Volume 100, November 2015, Pages 171-176
Journal: Fusion Engineering and Design - Volume 100, November 2015, Pages 171-176
نویسندگان
Boling Zhu, Shanwu Yang, Jianwen Ding, Wenhua Zhang, Yi Long, Farong Wan,