کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
6745578 504973 2015 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Influence of grain boundaries and pre-precipitates on ion implantation-induced precipitation in the V-4Cr-4Ti alloy
موضوعات مرتبط
مهندسی و علوم پایه مهندسی انرژی مهندسی انرژی و فناوری های برق
پیش نمایش صفحه اول مقاله
Influence of grain boundaries and pre-precipitates on ion implantation-induced precipitation in the V-4Cr-4Ti alloy
چکیده انگلیسی
The V-4Cr-4Ti alloy which contains the pre-precipitates has been subjected to implantation of high energy ions at room temperature. It was found that the Ti-rich precipitates occur at grain boundaries while the far finer precipitates form within the grains. The ion implantation also results in variation of appearance of the pre-precipitates in the samples. These results indicate that diffusion in the samples is obviously enhanced by ion implantation-induced vacancies. The vacancies will disappear at the grain boundaries and the precipitates/matrix interfaces, which will transfer vanadium atoms prior out of the boundaries or the interfaces due to Kirkendall effect. In this way, the Ti-rich precipitates will form at the boundaries. Meanwhile, the pre-precipitates will change their shape.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Fusion Engineering and Design - Volume 100, November 2015, Pages 171-176
نویسندگان
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