کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
691154 | 1460429 | 2014 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Improvement of optical and electrical properties of Boron-doped ZnO films by ITO buffer layers for photovoltaic application
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی شیمی
تکنولوژی و شیمی فرآیندی
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چکیده انگلیسی
Boron-doped ZnO (BZO) films were deposited by low pressure chemical vapor deposition (LPCVD) on glass substrates with tin-doped indium oxide (ITO) buffer layers varying from 0 to 100Â nm in thickness. The effects of ITO thickness on the structural, optical and electrical properties of BZO/ITO stacks were investigated. The sheet resistances of BZO/ITO stacks were decreased with increasing of ITO thickness while haze factors for BZO/ITO stacks were saturated at an ITO thickness of 50Â nm. X-ray diffraction spectra indicate that ITO (2Â 2Â 2) can promote the preferred orientation of BZO films changing from ã1Â 1Â 0ã to ã1Â 0Â 0ã. The grain size of the BZO films with ITO buffer layers was larger than that of those without ITO buffer layers. The simulated short circuit current of the silicon thin film solar cell when using BZO/ITO stacks as the TCO layers can be increased by a factor of 1.06 at an ITO thickness of 100Â nm.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of the Taiwan Institute of Chemical Engineers - Volume 45, Issue 6, November 2014, Pages 3016-3020
Journal: Journal of the Taiwan Institute of Chemical Engineers - Volume 45, Issue 6, November 2014, Pages 3016-3020
نویسندگان
Hung-Jen Yang, Chien-Hsun Chen, Kuen-Yi Wu, Chia-Ming Fan, Chien-Liang Wu, Chien-Fu Huang, Chun-Heng Chen, Jenn-Chang Hwang,