کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
6945718 1450518 2018 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
AlGaN/GaN Schottky barrier diodes on silicon substrates with various Fe doping concentrations in the buffer layers
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
AlGaN/GaN Schottky barrier diodes on silicon substrates with various Fe doping concentrations in the buffer layers
چکیده انگلیسی
This study demonstrated AlGaN/GaN Schottky barrier diodes (SBDs) for use in high-frequency, high-power, and high-temperature electronics applications. Four structures with various Fe doping concentrations in the buffer layers were investigated to suppress the leakage current and improve the breakdown voltage. The fabricated SBD with an Fe-doped AlGaN buffer layer of 8 × 1017 cm− 3 realized the highest on-resistance (RON) and turn-on voltage (VON) because of the memory effect of Fe diffusion. The optimal device was the SBD with an Fe-doped buffer layer of 7 × 1017 cm− 3, which exhibited a RON of 31.6 mΩ-cm2, a VON of 1.2 V, a breakdown voltage of 803 V, and a buffer breakdown voltage of 758 V. Additionally, the low-frequency noise decreased when the Fe doping concentration in the buffer layer was increased. This was because the electron density in the channel exhibited the same trend as that of the Fe doping concentration in the buffer layer.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronics Reliability - Volume 83, April 2018, Pages 238-241
نویسندگان
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