کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
6969123 | 1453016 | 2018 | 8 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Volatile organic compounds (VOCs) removal in non-thermal plasma double dielectric barrier discharge reactor
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی شیمی
بهداشت و امنیت شیمی
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
Non-thermal plasma (NTP) an emerging technology to treat volatile organic compounds (VOCs) present in unhygienic point source air streams. In present study, double dielectric barrier discharge (DDBD) reactors were used for the first time to evaluate the removal efficiency of VOCs mixture of different nature at constant experimental conditions (input power 16-65.8â¯W, VOCs mixture feeding rate 1-6â¯L/min, 100-101â¯ppm inlet concentration of individual VOC). Reactor A and B with discharge gap at 6â¯mm and 3â¯mm respectively, were used in current study. When treated at an input power of 53.7â¯W with gas feeding rate of 1â¯L/min in DDBD reactor A, removal efficiency of the VOCs were: tetrachloroethylene (100%), toluene (100%), trichloroethylene (100%), benzene (100%), ethyl acetate (100%) and carbon disulfide (88.30%); whereas in reactor B, the removal efficiency of all VOCs were 100%. Plasma-catalyst (Pt-Sn/Al2O3, BaTiO3 and HZSM-5) synergistic effect on VOCs removal efficiency was also investigated. Highest removal efficiency i.e 100% was observed for each compound with BaTiO3 and HZSM-5 at an input power 65.8â¯W. However, integrating NTP with BaTiO3 and HZSM-5 leads to enhanced removal performance of VOCs mixture with high activity, increase in energy efficiency and suppression of unwanted byproducts.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Hazardous Materials - Volume 347, 5 April 2018, Pages 317-324
Journal: Journal of Hazardous Materials - Volume 347, 5 April 2018, Pages 317-324
نویسندگان
Muhammad Farooq Mustafa, Xindi Fu, Yanjun Liu, Yawar Abbas, Hongtao Wang, Wenjing Lu,