کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
700541 | 890875 | 2007 | 11 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Nonlinear iterative learning control with applications to lithographic machinery
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی هوافضا
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
An experimental demonstration is given of (nonlinear) iterative learning control applied to a reticle stage of a lithographic wafer scanner. To limit the presence of noise in the learned forces, a nonlinear amplitude-dependent learning gain is proposed. With this gain, high-amplitude signal contents is separated from low-amplitude noise, the former being compensated by the learning algorithm. Contrary to the underlying linear design, the continuously varying trade-off between high-gain convergence rates and low-gain noise transmission demonstrates a significant improvement of the nonlinear design in achieving performance.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Control Engineering Practice - Volume 15, Issue 12, December 2007, Pages 1545–1555
Journal: Control Engineering Practice - Volume 15, Issue 12, December 2007, Pages 1545–1555
نویسندگان
Marcel Heertjes, Tim Tso,