کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
701150 1460818 2008 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Carbon nanocapsules encapsulating cobalt nanoparticles by pulsed discharge plasma chemical vapor deposition
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
Carbon nanocapsules encapsulating cobalt nanoparticles by pulsed discharge plasma chemical vapor deposition
چکیده انگلیسی

Silicon coated with a thin film of cobalt [Si/Co (10 nm)] is exposed to the plasma generated using CH4–H2 gas mixture by making a discharge between Si/Co substrates and Mo bent plate in pulsed discharge plasma chemical vapor deposition. At high plasma temperature and deposition pressure, carbon nanocapsules encapsulating Co nanoparticles are observed to form. They are investigated using high resolution transmission electron microscopy, scanning electron microscopy, visible Raman spectroscopy and X-ray diffraction. Present study indicates that the formation mechanism of carbon nanocapsules lie in the sputtering of Co thin film by the energetic ions from plasma at high deposition pressure which results in the formation of Co nanoparticles, on surface of which graphitic layers gets deposited at high plasma temperature. Present approach provides a novel strategy for the synthesis of high purity carbon nanocapsules encapsulating metal nanoparticles.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Diamond and Related Materials - Volume 17, Issues 4–5, April–May 2008, Pages 576–580
نویسندگان
, , , ,