Epitaxial lateral overgrowth (ELO) of homoepitaxial diamond through an iridium mesh

In the present work iridium layers forming a mesh on diamond have been studied as potential candidates for buried electrodes or stopping layers in an ELO process for heteroepitaxial diamond. Thin iridium layers (∼ 15 nm) were deposited by e-beam evaporation at ∼ 700 °C on the facets of individual (001)-oriented CVD diamond crystallites and macroscopic Ib HPHT substrates with off-axis angles of several degrees. The heteroepitaxial iridium films formed a mesh with 10–200 nm large holes. These were penetrated by homoepitaxial diamond in a microwave plasma chemical vapour deposition process (MWPCVD) burying the iridium layer completely after 15 min of diamond growth. High resolution X-ray diffraction including reciprocal space mapping and Raman spectroscopy was used to characterize the structural properties of the diamond overlayer on the Ib HPHT substrate. It was monocrystalline with an FWHM of 0.03–0.05° of the X-ray rocking curve. Its lattice planes were tilted by ∼ 0.01° with respect to the substrate and showed a macroscopic strain of − 10− 4 perpendicular to the surface. Besides the smaller lattice constant due to the lack of nitrogen the strain is mostly attributed to a tensile in-plane stress state. Strain and tilt can be attributed to the lateral overgrowth and the off-axis angle of the substrate.