کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
701366 1460820 2006 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Deposition and characteristics of iron–silicon thin film catalyst for CNT growth
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
Deposition and characteristics of iron–silicon thin film catalyst for CNT growth
چکیده انگلیسی

Fe–Si catalyst thin films for the growth of carbon nanotubes were prepared using co-sputter deposition. As-deposited Fe–Si films consist of different amounts of α-Fe and amorphous Si. The amount depends on the Si concentration in the film. Hydrogen plasma etched Fe–Si films become particles having different sizes. The particle size is also dependent on the Si concentration. Correlation among the Si concentration, the particle size, and the growth rate of carbon nanotube was made. Optimal growth of carbon nanotubes at 370 °C was obtained at an average particle size of 45 nm or a Si concentration of 21%.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Diamond and Related Materials - Volume 15, Issues 11–12, November–December 2006, Pages 1834–1838
نویسندگان
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