Two-step polishing technique for single crystal diamond (100) substrate utilizing a chemical reaction with iron plate

• We proposed a two-step polishing technique for single-crystal diamond substrates.
• The surface irregularities on the diamond substrate were removed efficiently in first step polishing.
• The resultant diamond surface has atomic-level smoothness and a damage-free structure within 5 h.

A polishing technique for diamond substrates is described. It is a two-step process, consisting of (1) a rough processing step using carbon reaction with an iron plate at elevated friction temperatures, and (2) a finish processing step using hydroxyl (OH) radicals generated by a Fenton reaction between an iron plate and hydrogen peroxide solution. We analyzed the processing characteristics using optical interferometric microscopy, atomic force microscopy and transmission electron microscopy. Experimental results show that the surface roughness of a diamond substrate is markedly improved to an atomic-scale smoothness, and that a damage-free diamond surface can be fabricated with 5 h of polishing. These results provide useful information for obtaining atomically smooth diamond substrates.

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