کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
702105 1460789 2014 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
A novel microwave plasma reactor with a unique structure for chemical vapor deposition of diamond films
ترجمه فارسی عنوان
یک رآکتور جدید مایکروویو پلاسما با ساختار منحصر به فرد برای تخمیر بخار شیمیایی فیلمهای الماس
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی برق و الکترونیک
چکیده انگلیسی


• The proposed microwave plasma reactor has a novel structure, which is the combination of cylinder and ellipsoid.
• A simple but effective simulation method is established to design the microwave plasma reactor.
• An ingenious design has been adopted to solve the problem of parasitic plasma, which has not been reported before.
• The results of both simulation and experiments show a good performance of the newly designed reactor.

With the aid of numerical simulation, a novel microwave plasma reactor for diamond films deposition has been designed. The new reactor possesses a unique structure, neither purely cylindrical nor purely ellipsoidal, but a combination of the both. In this paper, the design strategy of the new reactor together with a simple but reliable phenomenological simulation method will be described. Preliminary experiments show that uniform diamond films of high quality could be deposited using the new reactor, and the deposition rate of diamond films is typically about 3 μm/h at 6 kW input power level on a 2 inch diameter silicon substrate.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Diamond and Related Materials - Volume 42, February 2014, Pages 28–32
نویسندگان
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