Hydrogen on nanocrystalline diamond film surfaces

In this work we show the full quantification of surface composition of nanocrystalline diamond films (NCD), including hydrogen as a function of their surface morphology using X-ray-induced photoelectron spectroscopy and elastic peak electron spectroscopy. The surfaces of un-doped NCD films of various thickness deposited on Si/SiO2 substrates from methane and hydrogen gas mixture by microwave plasma chemical vapour deposition have been subjected to chemical treatment with H2SO4 + KNO3 at 200 °C to reduce a non-diamond phase and then hydrogenated in pure hydrogen plasma. To provide a comparison, the reference samples prepared under the same conditions but chemically untreated were analysed.

► Hydrogen detection at NCD film surfaces.
► Hydrogen quantification at NCD film surfaces.
► Complete quantitative analysis of NCD film surfaces (including hydrogen).