Development of triode type RF plasma enhanced CVD equipment for low temperature growth of carbon nanotube

Triode-type radio frequency plasma enhanced chemical vapor deposition (RF-PECVD) equipment has been developed in order to grow well-aligned carbon nanotubes on Si and glass substrates at 550 °C. The CVD equipment employs a grid electrode in addition to the cathode and anode electrodes. The grid electrode allows the growth of a well-aligned carbon nanotube with an inside and an outside diameter of 7 and 17 nm, respectively. Moreover, the patterning growth of the well-aligned CNT on a glass substrate was also demonstrated.