One-step CVD-diamond coating process on 3-D titanium substrates using reticulated vitreous carbon as a solid carbon source

Nanocrystalline diamond (NCD), formed on three-dimensional (3D) titanium (Ti) substrates, through the etching of reticulated vitreous carbon (RVC) was investigated. Porous Ti was prepared by powder metallurgy and the RVC was produced at 1300 and 2000 °C graphitization index. In this chemical vapor infiltration/deposition process, the RVC sample was used as the only carbon source that ensured the production of pertinent growth species directly on the Ti surfaces including its inner and bottom (the opposite side of the sample). The films were deposited at 630 °C substrate temperature. NCD scanning electron microscopy images showed agglomerates of nanometer crystallites with a uniform surface texture covering all sample. Raman measurements showed the typical two shoulders at 1150 and 1490 cm− 1 attributed to NCD formation. Electrochemical response by cyclic voltammetry measurements confirmed a wide potential window for such electrodes in addition to its exceptional reversibility response.