A compact ellipsoidal cavity type microwave plasma reactor for diamond film deposition

Electric field distribution in ellipsoidal microwave cavities with different sizes was modeled by the finite difference time-domain method (FDTD). The influence of varying size on the performance of the ellipsoidal cavities was studied. Through the simulations, eight series of resonant patterns were found. Based on this simulation result, a compact ellipsoidal cavity type microwave plasma chemical vapor deposition reactor has been proposed and its performance was predicted. It is shown that such a compact ellipsoidal cavity type reactor retains the same ability to concentrate microwave energy into its focus, facilitating both production of high density plasmas and deposition of diamond films.

Research Highlights
► Influence of varying size on performance of the ellipsoidal cavities was studied.
► Eight “TM0mn” resonant modes were found during the simulations.
► A compact ellipsoidal cavity type MPCVD reactor of the “TM033” mode was proposed.