کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
703062 891125 2010 8 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
A super-high speed polishing technique for CVD diamond films
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
A super-high speed polishing technique for CVD diamond films
چکیده انگلیسی

A new set-up for polishing of CVD diamond films on a high speed rotating titanium plate has been developed. The influence of polishing pressure on the surface character, roughness and material removal rate have been studied by using scanning electron microscopy, stylus profilometer, X-ray photoelectron spectroscopy and Raman spectroscopy before and after polishing, respectively. The results showed that the material removal mechanism is mainly the chemical reaction between carbon and titanium and the diffusion of carbon atoms into the polishing plate during the super-high speed polishing. The current method exhibits a high polishing rate in only a few hours. This preliminary result reveals a great potential for commercializing.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Diamond and Related Materials - Volume 19, Issue 10, October 2010, Pages 1316–1323
نویسندگان
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