Diamond films with preferred <110> texture by hot filament CVD at low pressure

The effects of gas pressure on the textured growth of diamond films were investigated in a hot filament chemical vapor deposition (HFCVD) system. Diamond thin film with the growth rate of 1.3 μm/h and with high <110> texture was obtained at 5 Torr when lowering the gas pressure from 40 Torr to 1 Torr. The formation of high density nanocrystalline diamond nuclei elongated along the <110> direction in the nucleation stage and its consequent growth at lower pressure were considered to be responsible for the formation of <110> textured diamond thin film.