Fabrication of carbon nanowalls using electron beam excited plasma-enhanced chemical vapor deposition

Carbon nanowalls (CNWs), two-dimensional nanostructured carbon, were synthesized by an electron beam excited plasma-enhanced chemical vapor deposition (EBEP-CVD) employing a mixture of CH4 and H2 at a total pressure of 2–4 Pa. High growth rate of 32 nm/min for the synthesis of well-defined, vertically aligned CNW film was attained at the total gas pressure of 4.0 Pa. CNWs were characterized by scanning electron microscopy, transmission electron microscopy, and micro-Raman spectroscopy. The EBEP-CVD proved to have a great potential for fabricating carbon nanostructures.