Isoconversional kinetics of thermal oxidation of mesoporous silicon

- Nonisothermal thermal oxidation of mesoporous silicon is examined with STA.
- Model-free and model-fitting methods are used to the oxidation kinetic analysis.
- The oxidation has two steps. It started by surface groups by Avrami-Erofeev model.
- Second is oxidation controlled by 3D diffusion of oxygen through the silica layer.