Synthesis of POSS-containing fluorosilicone block copolymers via RAFT polymerization for application as non-wetting coating materials

By using a polydimethylsiloxane (PDMS) macro-chain transfer agent with trithiocarbonate groups at both ends, fluorosilicone block copolymers containing polyhedral oligomeric silsesquioxane (POSS) were synthesized via reversible addition-fragmentation chain transfer (RAFT) polymerization. Acryloisobutyl POSS (APOSS) and 2,2,3,4,4,4-hexafluorobutyl acrylate (HFBA) were sequentially introduced into the copolymers. The obtained triblock copolymers PDMS-b-(PAPOSS)2 exhibited a low polydispersity index (PDI) of less than 1.42 in the first 6 h of polymerization, but the PDI value became broader later because of the steric hindrance of the POSS macromer. The POSS-containing fluorosilicone pentablock copolymers with a PDI of about 2.0, which were prepared by the further RAFT polymerization of HFBA, showed clear microphase separation. The average roughness values of the copolymer films were enhanced by introducing POSS, and a certain POSS content led to a significant decrease of the receding contact angle. Measurements of water contact angles and ice shear strengths demonstrated that the non-wetting properties of the copolymer films were improved by the incorporation of both POSS and fluorine blocks. The block copolymers combine the advantages of POSS, PDMS and fluoropolymers, and can be potentially applied as non-wetting coating materials for anti-icing or anti-frosting.