Contribution of CN(X2Σ+) radicals to N atoms of hydrogenated amorphous carbon nitride films formed from the microwave discharge of the gas mixture of N2 and CH3CN

Contribution of CN(X2Σ+) radicals to N atoms of hydrogenated amorphous carbon nitride films formed from the microwave discharge of the gas mixture of N2 and CH3CN

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Diamond and Related Materials - Volume 63, March 2016, Pages 125-131

Haruhiko Ito, Nobuyoshi Mogi, Kohtaro Okada, Hiroki Tsudome,