Nanometric cutting in a scanning electron microscope

A nanometric cutting device under high vacuum conditions in a scanning electron microscope (SEM) was developed. The performance, tool-sample positioning, and processing capacity of the nanometric cutting platform were studied. The proposed device can be used to realize a displacement of 7 μm, with a closed-loop resolution of 0.6 nm in both the cutting direction and the depth direction. Using a diamond cutting tool with an edge radius of 43 nm formed by focused ion beam (FIB) processing, nanometric cutting experiments on monocrystalline silicon were performed on the developed cutting device under SEM online observation. Chips and machining results of different depths of cut were studied during the cutting process, and cutting depths of less than 10 nm could be obtained with high repeatability. Moreover, the cutting speed was found to exhibit a strong relationship with the brittle-ductile transition depth on brittle material. The experimental results of taper cutting and sinusoidal cutting indicated that the developed device has the ability to perform multiple degrees of freedom (DOFs) cutting and to study nanoscale material removal behaviour.