کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7224060 | 1470566 | 2018 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Influence of physical plasma etching treatment on optical and hydrophilic MgF2 thin film
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی (عمومی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Influence of physical plasma etching treatment on optical and hydrophilic MgF2 thin film Influence of physical plasma etching treatment on optical and hydrophilic MgF2 thin film](/preview/png/7224060.png)
چکیده انگلیسی
In this study, MgF2 thin film was prepared on glass substrate by thermal evaporation method. After that surface of the MgF2 thin film was improved using physical plasma etching treatment by plasma enhanced chemical vapor deposition (PECVD) equipment. Structural properties and surface morphology and roughness of the thin films were evaluated by GIXRD, FESEM and AFM, respectively. Also optical properties were investigated throughout measurement of transmission spectra and refractive index in visible region by use of UV/vis spectrometer and ellipsometer, respectively. Water contact angles of the surfaces were measured by water contact analyzer. Results of the research indicated that transparency of the MgF2 thin films remind without change and hydrophilic properties of the MgF2 thin films turned to superhydrophilic properties after physical plasma etching treatment.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Optik - Volume 161, May 2018, Pages 1-7
Journal: Optik - Volume 161, May 2018, Pages 1-7
نویسندگان
Akbar Eshaghi, Morteza Mesbahi, Abbas Ail Aghaei,