کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
7225375 1470573 2018 16 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Study of silicon films deposited by EB-PVD and the effect of applying annealing conditions on them
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی (عمومی)
پیش نمایش صفحه اول مقاله
Study of silicon films deposited by EB-PVD and the effect of applying annealing conditions on them
چکیده انگلیسی
This paper investigates structural, electronic, and optical silicon poly-crystalline coatings created in high vacuum condition (10−6 Torr) by Electron Beam Physical Vapor Deposition (EB-PVD). Samples were annealed after deposition in neutral gas environment of 800 °C temperature. Results of microscopic images, micro Raman analysis and Grazing Incidence X-ray Diffraction (GIXRD) showed that phase change happened from amorphous structure to crystalline structure in initial amorphous context which could be significantly enhanced by increasing annealing temperature. Aggregation and accumulation of silicon nano-crystals were also observed. Moreover, applying temperature of 800 °C in one-hour resulted in complete crystallization and homogeneity of films. The situation caused the increase of SP2 SP3 bonds formed with more free electrons producing higher conductivity of electric film in the layers. Finally, because of increased density of film structure, light reflectance decreased from %12 to %3 due to poly-crystalline structure created in initial amorphous context.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Optik - Volume 154, February 2018, Pages 601-609
نویسندگان
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