کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
7832724 1503512 2018 17 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Qualitative analysis of growth mechanism of polycrystalline InAs thin films grown by molecular beam epitaxy
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Qualitative analysis of growth mechanism of polycrystalline InAs thin films grown by molecular beam epitaxy
چکیده انگلیسی
The mechanism of surfaces/interfaces and precise control of growth morphology is a key parameter for any specific device application. Herein, we report on a qualitative growth study of molecular beam epitaxy-grown polycrystalline InAs thin films on a lattice-mismatched Si(1 0 0) substrate using atomic force microscopy. The height-height correlation function (HHCF) and power spectral density function (PSDF) were employed to analyze the surface structures. Clear oscillatory behavior in the HHCF for sufficiently larger lateral distances suggests a mound-like morphology, which was confirmed by the existence of a characteristic frequency peak in the PSDF. The growth mechanism is described qualitatively by the Schwoebel barrier (roughening) effect coupled with the Mullins diffusion model (smoothing effect).
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 462, 31 December 2018, Pages 81-85
نویسندگان
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