کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7832724 | 1503512 | 2018 | 17 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Qualitative analysis of growth mechanism of polycrystalline InAs thin films grown by molecular beam epitaxy
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Qualitative analysis of growth mechanism of polycrystalline InAs thin films grown by molecular beam epitaxy Qualitative analysis of growth mechanism of polycrystalline InAs thin films grown by molecular beam epitaxy](/preview/png/7832724.png)
چکیده انگلیسی
The mechanism of surfaces/interfaces and precise control of growth morphology is a key parameter for any specific device application. Herein, we report on a qualitative growth study of molecular beam epitaxy-grown polycrystalline InAs thin films on a lattice-mismatched Si(1â¯0â¯0) substrate using atomic force microscopy. The height-height correlation function (HHCF) and power spectral density function (PSDF) were employed to analyze the surface structures. Clear oscillatory behavior in the HHCF for sufficiently larger lateral distances suggests a mound-like morphology, which was confirmed by the existence of a characteristic frequency peak in the PSDF. The growth mechanism is described qualitatively by the Schwoebel barrier (roughening) effect coupled with the Mullins diffusion model (smoothing effect).
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 462, 31 December 2018, Pages 81-85
Journal: Applied Surface Science - Volume 462, 31 December 2018, Pages 81-85
نویسندگان
Arpana Agrawal, Youngbin Tchoe, Heehun Kim, Joon Young Park,