Direct pattern of photocurable glycidoxypropyltrimethoxysilane based sol-gel hybrid waveguides for photonic applications

We report on a photosensitive hybrid material based on 3-glycidoxypropyltrimethoxysilane (GPTMS) and on the cationic photopolymerization of the epoxide groups. In particular, we describe the synthesis and fabrication of patterned waveguide structures by ultraviolet (UV) irradiation through a quartz slide with a metallic mask. An increase of 0.01 of the material refractive index has been measured when the film is exposed to UV light in the range of 220-260 nm. The surface morphology and the optical properties of the structures are reported.