کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
7886905 1509789 2018 11 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Influence of angle deposition on the properties of ZnTe thin films prepared by thermal evaporation
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله
Influence of angle deposition on the properties of ZnTe thin films prepared by thermal evaporation
چکیده انگلیسی
Thin films of ZnTe were deposited at angles of 0°, 20°, 40°, 60° and 80° by thermal evaporation. The chemical, structural, morphological, optical, and photocurrent properties of ZnTe thin films were investigated. The elemental composition of the films was investigated by energy dispersive x-ray spectroscopy (EDX) and x-ray photoelectron spectroscopy (XPS). EDX and XPS analyses showed that at lower angles (0° and 20°), the deposited films were Te-rich, at 40°, the deposited film was nearly stoichiometric; and at higher angles (60° and 80°), the deposited films were Zn-rich. X-ray diffraction (XRD) analysis showed that all films were polycrystalline. X-ray diffraction patterns showed that lower-angles-deposited films had an extra peak at 2θ = 36.47° that belongs to Te element. Atomic force microscopy analysis revealed that the surface roughness of films was increased by increasing the deposition angle from 0° to 80° because shadowing effect raised due to an oblique angle. It was observed that higher-angles-deposited films (ZnTe-60°, and ZnTe-80°) showed less transmittance and high reflectance compared to lower-angles-deposited films because of high metallic Zn content in these films. Current-voltage (I-V) measurements showed that nearly stoichiometric (ZnTe-40°) film showed better photocurrent response compared to non-stoichiometric films (ZnTe-0°, ZnTe-20°, ZnTe-60°, and ZnTe-80°).
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Ceramics International - Volume 44, Issue 9, 15 June 2018, Pages 10130-10140
نویسندگان
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