کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7888766 | 1509796 | 2018 | 22 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Oxidation behavior of amorphous silicon nitride nanoparticles
ترجمه فارسی عنوان
رفتار اکسیداسیون نانوذرات نیترید سیلیکون آمورف
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کلمات کلیدی
نانوذرات آمورف، واکسن اکسیداسیون، اکسیداسیون جایگزین،
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سرامیک و کامپوزیت
چکیده انگلیسی
Silicon oxynitride is a promising structural/functional material for high temperature applications. Silicon oxynitride can be synthesized through oxidation of amorphous silicon nitride (ASN) nanoparticles followed by a crystallization process. Oxidation of the ASN plays an important role during the synthesis. Here we investigated its oxidation mechanism in an atomic scale using experimental and modelling method. The results of Nitrogen-Oxygen analyzer and X-ray photoelectron spectroscopy indicate that a large amount of nitrogen vacancies exist in ASN, thus oxidation of ASN may include vacancy oxidation ( oxygen atoms move into the nitrogen vacancies) and replacement oxidation ( oxygen atoms replace nitrogen atoms). A model has been made to describe these two oxidation processes, from which the activation energy (Ea) of the vacancy oxidation and replacement oxidation is calculated to be 9.09Â kJ/mol and 118.25Â kJ/mol, respectively. These values agree well with Ea calculated from well-designed experiments, confirming the existence of the two different mechanisms during oxidation of ASN.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Ceramics International - Volume 44, Issue 2, 1 February 2018, Pages 1443-1447
Journal: Ceramics International - Volume 44, Issue 2, 1 February 2018, Pages 1443-1447
نویسندگان
D.H. Ma, H.J. Wang, M. Niu, J.B. Wen, H. Wei, J. Zhou, J.P. Fan, D.H. Zhang,