کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7893573 | 1509959 | 2018 | 10 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Electrochemical measurements and atomistic simulations of Clâ-induced passivity breakdown on a Cu2O film
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Electrochemical measurements and atomistic simulations of Clâ-induced passivity breakdown on a Cu2O film Electrochemical measurements and atomistic simulations of Clâ-induced passivity breakdown on a Cu2O film](/preview/png/7893573.png)
چکیده انگلیسی
The mechanism of passivity breakdown on Cu2O films was studied. The thickness and components of the film were estimated by EIS, AES and XPS analyses. The structural relaxations, energies, electronic properties and diffusion coefficients were calculated by first-principles calculations. Both the experimental and calculated results demonstrate that the film thinning is due to the adsorption of Clâ on the surface instead of a penetration process. The inner point defects facilitate the adsorption of Clâ, and the introduction of Clâ, in turn, increases the transport rate of point defects. A theoretical model was proposed, which is also applicable to local breakdown.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Corrosion Science - Volume 136, 15 May 2018, Pages 119-128
Journal: Corrosion Science - Volume 136, 15 May 2018, Pages 119-128
نویسندگان
Xin Wei, Chaofang Dong, Pan Yi, Aoni Xu, Zhanghua Chen, Xiaogang Li,