کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7923017 | 1511801 | 2015 | 9 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Effect of potassium fluoride on the in-situ sealing pores of plasma electrolytic oxidation film on AM50 Mg alloy
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
مواد الکترونیکی، نوری و مغناطیسی
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چکیده انگلیسی
The influence of potassium fluoride (KF) on the in-situ sealing pores of plasma electrolytic oxidation (PEO) film on AM50 Mg alloy has been investigated using a stereo-zoom optical microscope, scanning electron microscope (SEM) and energy dispersive X-ray spectroscope (EDS). The films formed in the solutions with and without KF were compared. The sketch map for the formation process of in-situ sealing pores was established. The in-situ sealing pore PEO film can be obtained in the solution with KF, while the PEO film with open pores is obtained in the solution without KF. It indicates that the addition of KF plays a key role in the formation of in-situ sealing pores. Moreover, KF can change the initial film and promote the film growth rate.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Chemistry and Physics - Volume 162, 15 July 2015, Pages 452-460
Journal: Materials Chemistry and Physics - Volume 162, 15 July 2015, Pages 452-460
نویسندگان
Feng Liu, Juan Yu, Yingwei Song, Dayong Shan, En-Hou Han,