Investigation of textured Al-doped ZnO thin films using chemical wet-etching methods

► The effects of deposition temperature on the electrical properties of ZnO:Al film is revealed in this study. ► The optical properties of textured ZnO:Al films etched in diluted HCl, H3PO4 and HNO3 were studied. ► The effects of etching parameters on the optical and electrical properties of ZnO:Al film are investigated in this study. ► The diluted HNO3 is the best candidate to fabricate excellent textured surface with the highest haze ratio in this study.