کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
8014609 1517172 2018 10 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
A simple strategy to tailor the microstructure and wear-resistance of sputtered WS2 films
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
A simple strategy to tailor the microstructure and wear-resistance of sputtered WS2 films
چکیده انگلیسی
Sputtered WS2 films can be modified by adding some amount of hetero-elements to overcome the porous columnar microstructure and thereby to enhance the wear resistance. However, the recession of tribological properties of WS2-hetero-element composite films in low earth orbit environment would be a potential danger because most hetero-elements succumbed to oxidation by atomic oxygen. Herein, by altering deposition argon pressure to adjust the plasmas bombard function on growing WS2 film, the characteristic porous microstructure disappeared. At the optimization condition, the sputtered WS2 film exhibited a dense microstructure, high ratio of S to W, and thereby much better wear-resistance. However, the excessive bombardment would result in the prominent loss of S atoms in WS2 film and the deterioration of tribological properties.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Letters - Volume 216, 1 April 2018, Pages 179-181
نویسندگان
, , , , , ,