Direct versatile PECVD growth of graphene nanowalls on multiple substrates

In this paper, we demonstrated a simple and versatile technique to directly produce high-quality graphene nanowalls (GNWs) on multiple substrates by radio frequency plasma enhanced chemical vapor deposition (RF-PECVD) at 750 °C without any catalyst and post-transfer. Similar morphologies and structures obtained under the same preparation process on different substrates revealed that the growth of GNWs was not sensitive to substrate. It was proposed that the GNWs grew via Volmer-Weber mechanism. The stresses from colliding islands would change the growth direction vertically upward. Then the erect growth along the edges would rely less on substrates. Owing to super-large surfaces and outstanding photoelectric properties, GNWs could bring broad applications of nanodevices.