کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
8024352 | 1517546 | 2018 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Phase-controlled growth of cobalt oxide thin films by atomic layer deposition
ترجمه فارسی عنوان
رشد فاز کنترل شده فیلم های نازک کبالت با رسوب لایه اتمی
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
چکیده انگلیسی
Cobalt oxide (CoOx) thin films were deposited on thermally grown SiO2 substrates by atomic layer deposition (ALD) using bis(1,4-di-iso-propyl-1,4-diazabutadiene)cobalt (C16H32N4Co) and oxygen (O2) as reactants at deposition temperatures ranging from 125 to 300â¯Â°C. X-ray diffraction (XRD) and Raman spectroscopic analysis indicated that a mixed-phase oxide consisting of CoO and Co3O4 was deposited at temperatures ranging from 125 to 250â¯Â°C. However, single-phase Co3O4 was deposited above the deposition temperature of 275â¯Â°C. Further, analyses by Rutherford backscattering spectrometry, transmission electron microscopy, and selected area electron diffraction along with XRD and Raman spectroscopy revealed that the single-phase cobalt oxide film was stoichiometric crystalline (spinel structure) with negligible N and C impurities. The optical band gap of the single-phase Co3O4 film was 1.98â¯eV and increased with decreasing deposition temperature. It was also shown that the mixed-phase cobalt oxide thin films could be converted into single-phase spinel Co3O4 by annealing at 350â¯Â°C in O2 ambient. It was further observed that the phase of the ALD-grown cobalt oxide thin film could be controlled by controlling the precursor or reactant pulsing condition. The study revealed that pure Co3O4 phase could be grown at a relatively low temperature (250â¯Â°C) by using water vapor as a reactant. Therefore, this work systemically demonstrated several pathways to grow single-phase Co3O4 by ALD using a novel metalorganic cobalt precursor.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 337, 15 March 2018, Pages 404-410
Journal: Surface and Coatings Technology - Volume 337, 15 March 2018, Pages 404-410
نویسندگان
Soonyoung Jung, Dip K. Nandi, Seungmin Yeo, Hyungjun Kim, Yujin Jang, Jong-Seong Bae, Tae Eun Hong, Soo-Hyun Kim,